Understanding the Vacuum and its usefulness for Semi-conductor manufacturing Equipments
Author(s): Ganesh Babu Chandrasekaran
Publication #: 2601025
Date of Publication: 30.01.2026
Country: United States
Pages: 1-6
Published In: Volume 12 Issue 1 January-2026
DOI: https://doi.org/10.62970/IJIRCT.v12.i1.2601025
Abstract
Vacuum technology is a foundational enabler of semiconductor manufacturing. Nearly every critical process—thin film deposition, plasma etching, ion implantation, lithography, and contamination control—depends on the ability to create and maintain controlled vacuum environments [1], [6], [7]. As device geometries shrink to the nanometer scale and wafer sizes increase to 300 mm and beyond, the precision and stability of vacuum systems become increasingly essential [2], [11]. This paper provides a comprehensive examination of vacuum fundamentals, the physics governing low pressure environments, and the critical role vacuum plays in semiconductor manufacturing equipment. Emphasis is placed on the relationship between vacuum level, plasma behavior, contamination control, and thin film quality, as well as the engineering challenges associated with designing vacuum compatible chambers and subsystems.
Keywords: Vacuum integrity, Process uniformity, Yield improvement, High performance chambers, Vacuum compatible materials, Low outgassing materials.
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